Denka’s cutting-edge Gallium ion source “L-MION” achieves stable ion emission through our proprietary chip processing techniques developed over a long history of ion emitter development.
L-MION achieves incredibly stable ion emission characteristics by the utilization of our superior finishing technologies applied to tungsten needles. These processes achieve excellent gallium wettability and stable application of liquid gallium to ensure lasting quality and performance.
– Cross-sectional observation of semiconductor devices
– Machining of magnetic disk heads
– Cross-sectional specimen preparation for TEM
Please contact firstname.lastname@example.org for any inquiry.